Copyright (C) 2010 S. Karger AG, Basel”
“In

high aspect ratio (HAR) plasma etching of holes and trenches in dielectrics, sporadic twisting is often observed. Twisting is the randomly occurring check details divergence of a hole or trench from the vertical. Many causes have been proposed for twisting, one of which is stochastic charging. As feature sizes shrink, the fluxes of plasma particles, and ions in particular, into the feature become statistical. Randomly deposited charge by ions on the inside of a feature may be sufficient to produce lateral electric fields which divert incoming ions and initiate nonvertical etching or twisting. This is particularly problematic when etching with fluorocarbon gas mixtures where deposition of polymer in the feature may trap charge. dc-augmented capacitively coupled

plasmas (dc-CCPs) have been investigated as a remedy for twisting. In these devices, high energy electron (HEE) beams having narrow angular spreads can be generated. HEEs incident onto the wafer which penetrate into HAR features can neutralize the positive charge and so reduce the incidence of twisting. In this paper, we report on results from a computational investigation of plasma etching of SiO(2) in a dc-CCP using Ar/C(4)F(8)/O(2) Z-DEVD-FMK in vitro gas mixtures. We found that HEE beams incident onto the wafer are capable of penetrating into features and partially neutralizing positive charge buildup due to sporadic ion charging, thereby reducing the incidence of twisting. Increasing the

rf bias power increases the HEE beam energy and flux with some indication of improvement Quisinostat of twisting, but there are also changes in the ion energy and fluxes, so this is not an unambiguous improvement. Increasing the dc bias voltage while keeping the rf bias voltage constant increases the maximum energy of the HEE and its flux while the ion characteristics remain nearly constant. For these conditions, the occurrence of twisting decreases with increasing HEE energy and flux.”
“Background In this study, we examined two polycaprolactone (PCL)-based dermal filler formulas (PCL-1; PCL-2) for safety, patient satisfaction, likelihood to return, efficacy, and duration of correction. Objective This 40-patient, 24-month, prospective, randomized, controlled study evaluated the efficacy, safety, longevity, and volume of two PCL formulas for correction of nasolabial folds. Methods Patients enrolled in a medical clinic in Europe received two injections 1month apart and returned at 3, 6, 9, 12, 15, 18, and 24months for blinded patient evaluation using accepted aesthetic rating scales. Results At 12months, the efficacy outcomes on Wrinkle Severity Rating Scale (WSRS) and Global Aesthetic Improvement Scale (GAIS) of PCL-1 and PCL-2 were consistently maintained, with sustained improvement in 90% and 91.4% of patients, respectively.